| US 7,514,660 B2 | ||
| Focusing apparatus, focusing method, and inspection apparatus | ||
| Masami Ikeda, Shizuoka (Japan); and Satoshi Endo, Shizuoka (Japan) | ||
| Assigned to NuFlare Technology, Inc., Numazu-shi (Japan) | ||
| Filed on May 29, 2007, as Appl. No. 11/754,515. | ||
| Claims priority of application No. 2006-149572 (JP), filed on May 30, 2006. | ||
| Prior Publication US 2007/0280664 A1, Dec. 06, 2007 | ||
| Int. Cl. G02B 7/04 (2006.01); G03B 13/00 (2006.01) | ||
| U.S. Cl. 250—201.2 [250/201.4; 396/82; 348/354] | 10 Claims |

| 1. An inspection apparatus comprising:
a first sensor and a second sensor configured to receive an optical image of a target workpiece to be inspected and photoelectrically
convert the optical image of the target workpiece;
a first optical system configured to focus the optical image on the first sensor;
a second optical system configured to branch the optical image from the first optical system, and focus the branched optical
image on the second sensor;
a focus detection part configured to input first image signals photoelectrically converted by the first sensor and second
image signals photoelectrically converted by the second sensor, to differentiate the first and second image signals respectively,
to calculate frequency distribution with respect to differential values of the first image signals and differential values
of the second image signals respectively, to calculate density averages of frequencies of N % or more respectively, and to
detect a focus position of the optical image by using the density averages of frequencies of N % or more as high frequency
components of the first image signals and the second image signals;
a focus control part configured to control a focus of the first optical system based on the focus position detected by the
focus detection part; and
a comparison part configured to compare the first image signals photoelectrically converted from the focused optical image
and predetermined reference image signals.
|