| US 7,514,295 B2 | ||
| Method for processing a base that includes connecting a first base to a second base with an insulating film | ||
| Masataka Mizukoshi, Kawasaki (Japan); Nobuhiro Imaizumi, Kawasaki (Japan); and Yoshikatsu Ishizuki, Kawasaki (Japan) | ||
| Assigned to Fujitsu Limited, Kawasaki (Japan) | ||
| Filed on Aug. 04, 2005, as Appl. No. 11/196,487. | ||
| Application 11/196487 is a continuation in part of application No. 11/017875, filed on Dec. 22, 2004, abandoned. | ||
| Claims priority of application No. 2004-229921 (JP), filed on Aug. 05, 2004; and application No. 2005-159364 (JP), filed on May 31, 2005. | ||
| Prior Publication US 2006/0030071 A1, Feb. 09, 2006 | ||
| Int. Cl. H01L 21/60 (2006.01) | ||
| U.S. Cl. 438—118 [438/119; 29/830; 257/E21.511] | 10 Claims |

| 1. A method for processing a base comprising the steps of:
forming over a surface of a first base a first electrode having a projection and formed of a conductive material which is
solid and does not exhibit an adhesiveness at room temnerature, becomes soft and exhibits the adhesiveness at a temperature
not lower than a first temperature, and cures and loses the adhesiveness at a temperature not lower than a third temperature
higher than the first temperature;
covering over the surface of the first base including the first electrode with an insulating film of an insulating material
which exhibits an adhesiveness at a temperature not lower than a second temperature;
planarizing a surface of the first electrode and a surface of the insulating film by cutting with a cutting tool with the
first electrode and the insulating film retained at a temperature lower than a lower one of the first temperature and the
second temperature;
raising to a temperature not lower than a higher one of the first temperature and the second temperature; and
opposing a second base with a second electrode formed thereon and the first base to each other with the first electrode and
the second electrode in contact with each other to connect the first base and the second base by the insulating film while
electrically connecting the first electrode and the second electrode with each other.
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