| US 7,514,185 B2 | ||
| Preparation of photomask blank and photomask | ||
| Noriyasu Fukushima, Joetsu (Japan); Hiroki Yoshikawa, Joetsu (Japan); and Hideo Kaneko, Joetsu (Japan) | ||
| Assigned to Shin-Estu Chemical Co., Ltd., Tokyo (Japan) | ||
| Filed on May 17, 2005, as Appl. No. 11/130,278. | ||
| Claims priority of application No. 2004-147403 (JP), filed on May 18, 2004. | ||
| Prior Publication US 2005/0260505 A1, Nov. 24, 2005 | ||
| Int. Cl. G03F 1/00 (2006.01) | ||
| U.S. Cl. 430—5 | 17 Claims |
| 1. A method for preparing a photomask blank having a light-absorbing film on a transparent substrate, comprising the steps of forming a light-absorbing film on a transparent substrate, and irradiating the light-absorbing film with light from a flash lamp at an energy density of 3 to 40 J/cm2. |