| US 7,514,045 B2 | ||
| Covered microchamber structures | ||
| Craig S. Corcoran, Rockford, Ill. (US); Cindy Chia-Wen Chiu, San Dimas, Calif. (US); William J. Jaecklein, Mentor, Ohio (US); Dong-Tsai Hseih, Arcadia, Calif. (US); Eng-Pi Chang, Arcadia, Calif. (US); Le-Hoa Hong, Monterey Park, Calif. (US); Zhisong Huang, San Dimas, Calif. (US); Michael Lang, Chagrin Falls, Ohio (US); Ronald Sieloff, Chardon, Ohio (US); and Philip Yi Zhi Chu, Monrovia, Calif. (US) | ||
| Assigned to Avery Dennison Corporation, Pasadena, Calif. (US) | ||
| Filed on Jan. 17, 2003, as Appl. No. 10/346,279. | ||
| Claims priority of provisional application 60/349909, filed on Jan. 18, 2002. | ||
| Prior Publication US 2003/0180190 A1, Sep. 25, 2003 | ||
| Int. Cl. B01L 11/00 (2006.01); B32B 3/00 (2006.01) | ||
| U.S. Cl. 422—100 [422/102; 264/284] | 27 Claims |
| 1. A microchamber structure comprising a base layer, a lid layer, and at least one microchamber having a cross-sectional shape
with a depth of less than 1000 microns and a width of less than 1000 microns; wherein:
the base layer and the lid layer are superimposed, whereby one surface of the base layer is positioned adjacent to one surface
of the lid layer;
the base layer includes a depression extending inwardly from its lid-adjacent surface;
the lid layer includes a projection protruding outwardly from its base-adjacent surface and positioned within the depression
in the base layer; and
the depression of the base layer and the projection of the lid layer define the cross-sectional shape of the microchamber;
wherein the structure has lateral edges and the microchamber extends to the lateral edges.
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