US 7,513,820 B2
Method and apparatus for producing micro-texture on a slider substrate using chemical and mechanical polishing techniques
Niraj Mahadev, Milpitas, Calif. (US); Winston Jose, San Jose, Calif. (US); Kazumasa Yasuda, Sunnyvale, Calif. (US); Rudy Ayala, San Jose, Calif. (US); and Tam Nguyen, San Jose, Calif. (US)
Assigned to SAE Magnetics (H.K.) Ltd., Shatin, N.T. (Hong Kong Special Administrative Region of the People's Republic of China, The)
Filed on Mar. 16, 2006, as Appl. No. 11/378,100.
Prior Publication US 2007/0218807 A1, Sep. 20, 2007
Int. Cl. B24B 1/00 (2006.01)
U.S. Cl. 451—36  [451/59; 451/272; 451/273; 216/22; 29/603.16] 24 Claims
OG exemplary drawing
 
1. A method, comprising:
formulating an abrasive slurry solution of predetermined desired acidity;
treating a chemical mechanical polishing pad with the abrasive slurry;
rotating the chemical mechanical polishing pad;
disposing at least one slider body on the chemical mechanical polishing pad, wherein said disposing at least one slider includes grouping the at least one slider body in at least one row bar attached to a fixture;
lapping and grinding the at least one slider body for a predetermined period of time, and oscillating the fixture to enhance the lapping and the grinding; wherein a rotational velocity of the chemical mechanical polishing pad and the oscillation of the fixture is chosen to result in tangential forces parallel to the direction of the chemical mechanical polishing pad's rotation.