| US 7,513,608 B2 | ||
| Dielectric film structure, piezoelectric actuator using dielectric element film structure and ink jet head | ||
| Hiroshi Aoto, Kanagawa (Japan); Kenichi Takeda, Kanagawa (Japan); Tetsuro Fukui, Kanagawa (Japan); and Toshihiro Ifuku, Kanagawa (Japan) | ||
| Assigned to Canon Kabushiki Kaisha, Tokyo (Japan) | ||
| Filed on Jan. 25, 2006, as Appl. No. 11/338,774. | ||
| Application 11/338774 is a division of application No. 10/769765, filed on Feb. 03, 2004, granted, now 7,059,711. | ||
| Claims priority of application No. 2003-031681 (JP), filed on Feb. 07, 2003; and application No. 2003-031682 (JP), filed on Feb. 07, 2003. | ||
| Prior Publication US 2006/0176342 A1, Aug. 10, 2006 | ||
| Int. Cl. B41J 2/045 (2006.01) | ||
| U.S. Cl. 347—68 | 5 Claims |
| 1. A dielectric film structure having a substrate and a dielectric film provided on said substrate, wherein
said dielectric film has (111) face orientation with respect to the substrate; and
a value v in the following equation regarding said dielectric film is a real number greater than 2:
v=(C111/C−110)×(W−110/W111)
where C111 is a count number of a peak of a (111) face of said dielectric film in an out-of-plane X ray diffraction measurement; C−110 is a count number of a peak of a (−110 ) face of said dielectric film in an in-plane X ray diffraction measurement; W111 is a half-value width of a peak of the (111) face of said dielectric film in an out-of-plane rocking curve X ray diffraction
measurement; and W−110 is a half-value width of a peak of the (−110 ) face of said dielectric film in an in-plane rocking curve X ray diffraction
measurement.
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