US 7,352,478 B2
Assessment and optimization for metrology instrument
Charles N. Archie, Granite Springs, N.Y. (US); and G. William Banke, Jr., Essex Junction, Vt. (US)
Assigned to International Business Machines Corporation, Armonk, N.Y. (US)
Appl. No. 10/524,286
PCT Filed Dec. 20, 2002, PCT No. PCT/US02/41180
§ 371(c)(1), (2), (4) Date Feb. 10, 2005,
PCT Pub. No. WO2004/059247, PCT Pub. Date Jul. 15, 2004.
Prior Publication US 2005/0222804 A1, Oct. 06, 2005
This patent is subject to a terminal disclaimer.
Int. Cl. G01B 11/14 (2006.01)
U.S. Cl. 356—625  [700/121] 18 Claims
OG exemplary drawing
 
1. A method for assessing a measurement system under test (MSUT), the method comprising the steps of:
(a) providing a substrate having a plurality of structures;
(b) measuring a dimension of the plurality of structures using a reference measurement system (RMS) to generate a first data set, and calculating an RMS uncertainty (URMS) from the first data set, where the RMS uncertainty (URMS) is defined as one of an RMS precision and an independently determined RMS total measurement uncertainty (TMURMS);
(c) measuring the dimension of the plurality of structures using the MSUT to generate a second data set, and calculating a precision of the MSUT from the second data set;
(d) conducting a linear regression analysis of the first and second data sets to determine a corrected precision of the MSUT and a net residual error;
(e) determining a total measurement uncertainty (TMU) for the MSUT by removing the RMS uncertainty (URMS) from the net residual error; and
(f) outputting the TMU to a system capable of optimizing the MSUT.