US 7,511,144 B2
Reverse hydroxamic acid derivatives
Masanao Shimano, Kyoto (Japan); Noriyuki Kamei, Kyoto (Japan); Tomohiro Tanaka, Kyoto (Japan); Tatsuhiro Harada, Kyoto (Japan); Makoto Haino, Kyoto (Japan); Akihiko Okuyama, Kyoto (Japan); Yoshio Arakawa, Kyoto (Japan); and Yoshiko Murakami, Kyoto (Japan)
Assigned to Kaken Pharmaceutical Co., Ltd., Tokyo (Japan)
Appl. No. 10/488,530
PCT Filed Sep. 05, 2002, PCT No. PCT/JP02/09036
§ 371(c)(1), (2), (4) Date Mar. 04, 2004,
PCT Pub. No. WO03/022801, PCT Pub. Date Mar. 20, 2003.
Claims priority of application No. 2001-272527 (JP), filed on Sep. 07, 2001.
Prior Publication US 2004/0242928 A1, Dec. 02, 2004
Int. Cl. C07D 215/38 (2006.01); C07D 215/44 (2006.01)
U.S. Cl. 546—157  [546/153] 9 Claims
 
1. A reverse hydroxamic acid derivative represented by a general formula (Ia):

OG Complex Work Unit Drawing
{wherein A is a hydrogen atom, a lower alkyl, a cycloalkyl or —NR3R4 (wherein R3 and R4 are independently a hydrogen atom, a lower alkyl or a cycloalkyl, or form a nitrogen-containing heterocycle together with the nitrogen to which R3 and R4 are attached) Ar1 is phenylene; Ar2 is an optionally substituted quinolinyl; R1 is a hydrogen atom, an optionally substituted lower alkyl, an optionally substituted lower alkenyl or an optionally substituted cycloalkyl; R2a is represented by a general formula (a):

OG Complex Work Unit Drawing
(wherein R5 and R6 are independently a hydrogen atom, a halogen atom, hydroxyl, cyano, trifluoromethyl, an optionally substituted lower alkyl or an optionally substituted lower alkoxy; R68 and R69 are independently a hydrogen atom or an optionally substituted lower alkyl; X1 and Y1 are independently a single bond, oxygen, sulfur, —CR7R8— (wherein R7 and R8 are independently the same as R5) or —NR9— (wherein R9 is a hydrogen atom or an optionally substituted lower alkyl, an optionally substituted aryl or an optionally substituted heteroaryl); Z1 is oxygen, sulfur, ═CR10R11 (wherein R10 and R11 are independently a hydrogen atom, a halogen atom, cyano, trifluoromethyl, an optionally substituted lower alkyl, carboxyl, —CONR12R13 (wherein R12 and R13 are independently a hydrogen atom, a lower alkyl or a cycloalkyl, or form a nitrogen-containing heterocycle together with the nitrogen to which R12 and R13 are attached), —COR14 (wherein R14 is a hydrogen atom, an optionally substituted lower alkyl, an optionally substituted lower alkoxy, an optionally substituted aryl, an optionally substituted aralkyl, an optionally substituted heteroaryl or an optionally substituted heteroarylalkyl)), ═NR15 (wherein R15 is a hydrogen atom, hydroxyl, an optionally substituted lower alkyl, an optionally substituted lower alkoxy or an optionally substituted acyl), —O(CH2)p1O— (wherein p1 is an integer from 2 to 4), —S(CH2)r1S— (wherein r1 is an integer from 2 to 4) or —O(CH2)t1S— (wherein t1is an integer from 2 to 4); m1 is an integer from 0 to 6; n1 and q1 are independently an integer from 0 to 3; and v1 is 0 or 1), by a general formula (b):

OG Complex Work Unit Drawing
(wherein R16 is a hydrogen atom, a halogen atom, hydroxyl, cyano, trifluoromethyl, an optionally substituted lower alkyl or an optionally substituted lower alkoxy; R17 is a hydrogen atom, a halogen atom, or an optionally substituted lower alkyl; R70 and R71 are independently a hydrogen atom or an optionally substituted lower alkyl; X2 and Y2 are independently a single bond, oxygen, sulfur, —CR18R19— (wherein R18 is a hydrogen atom, a halogen atom, an optionally substituted lower alkyl or an optionally substituted lower alkoxy, and R19 is a hydrogen atom, a halogen atom, hydroxyl, cyano, trifluoromethyl, an optionally substituted lower alkyl, an optionally substituted lower alkoxy, an optionally substituted acyl, carboxyl, —CONR20R21 (wherein R20 and R21 are independently a hydrogen atom, a lower alkyl or a cycloallcyl, or form a nitrogen-containing heterocycle together with the nitrogen to which R20 and R21 are attached), —SO2R22 (wherein R22 is a lower alkyl, a cycloalkyl, an optionally substituted aryl or an optionally substituted heteroaryl), —NR23R24 (wherein R23 and R24 are independently a hydrogen atom, an optionally substituted lower alkyl, formyl, an optionally substituted acyl, a lower alkylsulfonyl, an optionally substituted arylsulfonyl, an optionally substituted heteroarylsulfonyl, —CONR25R26 (wherein R25 and R26 are independently a hydrogen atom, an optionally substituted lower alkyl, an optionally substituted aryl or an optionally substituted heteroaryl, or form a nitrogen-containing heterocycle together with the nitrogen to which R25 and R26 are attached), or a cycloalkyl, or form a nitrogen-containing heterocycle together with the nitrogen to which R23 and R24 are attached), or —OCOR27 (wherein R27 is an optionally substituted lower alkyl, an optionally substituted aryl, an optionally substituted heteroaryl or —NR28R29 (wherein R28 and R29 are independently a hydrogen atom, an optionally substituted lower alkyl, an optionally substituted aryl or an optionally substituted heteroaryl, or form a nitrogen-containing heterocycle together with the nitrogen to which R28 and R29 we attached))), or —NR30— (wherein R30 is a hydrogen atom, an optionally substituted lower alkyl, an optionally substituted aryl, an optionally substituted heteroaryl, —COR31 (wherein R31 is a hydrogen atom, an optionally substituted lower alkyl or an optionally substituted lower alkoxy) or —CONR32R33 (wherein R32 and R33 are independently a hydrogen atom, a lower alkyl or a cycloalkyl, or form a nitrogen-containing heterocycle together with the nitrogen to which R32 and R33 are attached)); Z2 is two hydrogen atoms, oxygen, sulfur, ═CR34R35 (wherein R34 and R35 are independently a hydrogen atom, a halogen atom, cyano, trifluoromethyl or an optionally substituted lower alkyl, an optionally substituted acyl, carboxyl, —CONR36R37 (wherein R36 and R37 are independently a hydrogen atom, a lower alkyl or a cycloalkyl, or form a nitrogen-containing heterocycle together with the nitrogen to which 1(36 and 1(37 are attached)), ═NR38 (wherein R38 is a hydrogen atom, hydroxyl, an optionally substituted lower alkyl, an optionally substituted lower alkoxy or an optionally substituted acyl), —O(CH2)p2O— (wherein p2 is an integer from 2 to 4), —S(CH2)p2S— (wherein r2 is an integer from 2 to 4) or —O(CH2)r2S— (wherein t2 is an integer from 2 to 4); m2 is an integer from 0 to 6; n2 and q2 are independently an integer from 0 to 3, and v2 is 0 or 1), by a general formula (c):

OG Complex Work Unit Drawing
(wherein G1 is an unsaturated four to seven membered ring optionally substituted with 1 to 4 of independent R39 at an optional position; R39 is hydroxyl, a halogen atom, cyano, trifluoromethyl, an optionally substituted lower alkyl, an optionally substituted lower alkoxy, an optionally substituted acyl, carboxyl, —CONR40R41 (wherein R40 and R41 are independently a hydrogen atom, a lower alkyl or a cycloalkyl, or form a nitrogen-containing heterocycle together with the nitrogen to which R40 and R41 are attached), —SO2R42 (wherein R42 is a lower alkyl, a cycloalkyl, an optionally substituted aryl or an optionally substituted heteroaryl), —NR43R44 (wherein R43 and R44 are independently a hydrogen atom, an optionally substituted lower alkyl, formyl, an optionally substituted acyl, a lower alkylsulfonyl, an optionally substituted arylsulfonyl, an optionally substituted heteroarylsufonyl, —CONR45R46 (wherein R45 and R46 are independently a hydrogen atom, an optionally substituted lower alkyl, an optionally substituted aryl or an optionally substituted heteroaryl, or form a nitrogen-containing heterocycle together with the nitrogen to which R45 and R46 are attached) or a cycloalkyl, or form a nitrogen-containing heterocycle together with the nitrogen to which R43 and R44 are attached), or —OCOR47 (wherein R47 is an optionally substituted lower alkyl, an optionally substituted aryl, an optionally substituted heteroaryl or —NR48R49 (wherein R48 and R49 are independently a hydrogen atom, an optionally substituted lower alkyl, an optionally substituted aryl or an optionally substituted heteroaryl, or form a nitrogen-containing heterocycle together with the nitrogen to which R48 and R49 are attached)); and m3 is an integer from 0 to 6), by a general formula (da):

OG Complex Work Unit Drawing
(wherein G2a is an optionally substituted aryl, an optionally substituted heteroaryl, an optionally substituted cycloalkyl or an optionally substituted heterocycloalkyl each of which are substituted with R50 at an optional position (R50 is an optionally substituted lower alkyl or an optionally substituted lower alkenyl); and m4 is an integer from 0 to 6), by a general formula (e):

OG Complex Work Unit Drawing
(wherein R51 is —CR72═CR73—, —C≡C— or —CR74R75—CR76R77— (wherein R72, R73, R74, R75, R76 and R77 are independently a hydrogen atom or an optionally substituted lower alkyl); R52 is an optionally substituted aryl, an optionally substituted aralkyl, an optionally substituted heteroaryl, an optionally substituted heteroarylalkyl, an optionally substituted cycloalkyl, an optionally substituted cycloalkylalkyl, an optionally substituted heterocycloalkyl, an optionally substituted heterocycloalkenyl, an optionally substituted heterocycloalkylalkyl or an optionally substituted heterocycloalkenylalkyl; and m5 is an integer from 0 to 6), or by a general formula (f):

OG Complex Work Unit Drawing
(wherein R6, R68, R69, X1, Y1, Z1, n1, q1 and v1 are the same as defined above; and m6 is an integer from 1 to 6)}or a salt thereof.