| US 7,510,817 B2 | ||
| Photoresist polymer compositions | ||
| Didier Benoit, San Jose, Calif. (US); Adam Safir, Berkeley, Calif. (US); Han-Ting Chang, Livermore, Calif. (US); Dominique Charmot, Campbell, Calif. (US); Isao Nishimura, Mie (Japan); Akimasa Soyano, Mie (Japan); Kenji Okamoto, Mie (Japan); and Yong Wang, Mie (Japan) | ||
| Assigned to JSR Corporation, Tokyo (Japan) | ||
| Filed on Dec. 12, 2005, as Appl. No. 11/300,657. | ||
| Application 11/300657 is a continuation of application No. PCT/US2004/020351, filed on Jun. 25, 2004. | ||
| Claims priority of provisional application 60/483310, filed on Jun. 26, 2003. | ||
| Prior Publication US 2006/0257781 A1, Nov. 16, 2006 | ||
| Int. Cl. G03F 7/00 (2006.01); G03F 7/004 (2006.01) | ||
| U.S. Cl. 430—270.1 | 21 Claims |
| 1. A photoresist composition comprising a photo-acid generator and a polymeric resin comprising the formula:
[A]x[B]y[C]z
wherein A, B and C are each individually one of
 wherein x is between about 0 and about 200 inclusive, y is between about 1 and about 200 inclusive and z is between about
1 and about 200 inclusive, provided B≠C wherein the polymer is prepared by a living free radical process (LFRP) in the presence
of a chain transfer agent (CTA) having the formula:
 wherein R1 is any group that can be expelled as its free radical form in an addition-fragmentation reaction;
R2 and R3 are each independently selected from the group consisting of hydrogen, hydrocarbyl, substituted hydrocarbyl, heteroatom-containing
hydrocarbyl, and substituted heteroatom-containing hydrocarbyl, and combinations thereof, and optionally R2 and R3 together to form a double bond optionally substituted alkenyl moiety;
R4 is selected from the group consisting of hydrogen, hydrocarbyl, substituted hydrocarbyl, heteroatom-containing hydrocarbyl,
and substituted heteroatom-containing hydrocarbyl, and combinations thereof and optionally, R4 combines with R2 and/or R3 to form a ring structure, with said ring having from 3 to 50 non-hydrogen atoms; and
D is either sulfur, selenium or tellurium.
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