| US 7,510,816 B2 | ||
| Silicon-containing resist composition and patterning process | ||
| Katsuya Takemura, Joetsu (Japan); Kazumi Noda, Joetsu (Japan); and Youichi Ohsawa, Joetsu (Japan) | ||
| Assigned to Shin-Estu Chemical Co., Ltd., Tokyo (Japan) | ||
| Filed on Oct. 04, 2005, as Appl. No. 11/242,270. | ||
| Claims priority of application No. 2004-292290 (JP), filed on Oct. 05, 2004. | ||
| Prior Publication US 2006/0073413 A1, Apr. 06, 2006 | ||
| Int. Cl. G03C 1/73 (2006.01); G03F 7/039 (2006.01); G03F 7/20 (2006.01); G03F 7/30 (2006.01); G03F 7/36 (2006.01) | ||
| U.S. Cl. 430—270.1 [430/907; 430/905; 430/914; 430/919; 430/921; 430/925; 430/325; 430/326; 430/330; 430/331; 430/311; 430/313] | 6 Claims |
| 1. A resist composition comprising
(A) a polysiloxane comprising structural units having the following general formulae (1), (2) and (3):
 wherein R1 is a C3-C20 organic group with a straight, branched, cyclic or polycyclic structure which has a hydroxyl group on a carbon atom as a functional
group, which has at least 3 fluorine atoms, in total, on a carbon atom bonded to the hydroxyl-bonded carbon atom, and which
may further contain a halogen, oxygen or sulfur atom, R2 is a C1-C6 hydrocarbon group with a straight, branched or cyclic structure, R3 is an C3-C20 organic group with a straight, branched, cyclic or polycyclic structure which has a carboxyl group as a functional group,
said carboxyl group being protected with an acid-decomposable protecting group, and which may further contain a halogen, oxygen
or sulfur atom, R4 is as defined for R2, R5 is a C4-C16 organic group which has a lactone ring as a functional group and which may further contain a halogen, oxygen or sulfur atom,
R6 is as defined for R2, p is 0 or 1, q is 0 or 1, r is 0 or 1,
wherein the structural units having formula (2) are structural units having the following formula (6):
 wherein R7 is an acid labile group and n is an integer of 0 or 1, and
wherein the structural units having formula (3) are structural units having the following formula (7) or (8), or the following
structural unit 7 or 10:
 wherein Y is an oxygen atom, sulfur atom or methylene group and m is 0 or 1,
 (B) an acid generator having the structural formula (4):
 (C) a nitrogen-containing organic compound, and
(D) a solvent.
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