| US 7,510,635 B2 | ||
| High purity zinc oxide powder and method for production thereof, and high purity zinc oxide target and thin film of high purity zinc oxide | ||
| Yuichiro Shindo, Ibaraki (Japan); and Kouichi Takemoto, Ibaraki (Japan) | ||
| Assigned to Nippon Mining & Metals Co., Ltd., Tokyo (Japan) | ||
| Appl. No. 10/572,328 PCT Filed Sep. 08, 2004, PCT No. PCT/JP2004/013031 § 371(c)(1), (2), (4) Date Mar. 17, 2006, PCT Pub. No. WO2005/033355, PCT Pub. Date Apr. 14, 2005. |
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| Claims priority of application No. 2003-339317 (JP), filed on Sep. 30, 2003. | ||
| Prior Publication US 2007/0098626 A1, May 03, 2007 | ||
| Int. Cl. C01G 9/02 (2006.01) | ||
| U.S. Cl. 204—298.13 [423/622] | 20 Claims |
| 1. High purity zinc oxide powder having an impurity content excluding gas components of N, C, Cl, S and P of less than 10 wtppm, a total content of gas components of C, Cl and S of less than 100 wtppm, a content of Na of 1 wtppm or less, and a content of K of 1 wtppm or less. |