| US 7,348,129 B2 | ||
| Electron beam processing method and apparatus | ||
| Kazuyuki Mitsuoka, Nirasaki (Japan); Minoru Honda, Nirasaki (Japan); Song Yun Kang, Nirasaki (Japan); and Yusuke Saito, Nirasaki (Japan) | ||
| Assigned to Tokyo Electron Limited, Tokyo (Japan) | ||
| Filed on Mar. 29, 2004, as Appl. No. 10/810,633. | ||
| Claims priority of application No. 2003-091878 (JP), filed on Mar. 28, 2003. | ||
| Prior Publication US 2004/0248040 A1, Dec. 09, 2004 | ||
| Int. Cl. G03C 5/00 (2006.01); A61N 5/00 (2006.01) | ||
| U.S. Cl. 430—296 [430/942; 427/551; 427/595; 250/492.2; 250/492.3] | 10 Claims |
| 1. An electron beam processing method for processing an organic material film formed on a surface of an object to be processed
by using an electron beam,
wherein the electron beam is irradiated onto the organic material film through a hydrocarbon radical generating gas, a partial
pressure of which is greater than or equal to 0.1 Torr.
|