| US 7,509,035 B2 | ||
| Lamp array for thermal processing exhibiting improved radial uniformity | ||
| Joseph M. Ranish, San Jose, Calif. (US); Corina E. Tanasa, Mountain View, Calif. (US); Sundar Ramamurthy, Fremont, Calif. (US); Claudia Lai, Sunnyvale, Calif. (US); Ravi Jallepally, Santa Clara, Calif. (US); Ramachandran Balasubramanian, Santa Clara, Calif. (US); Aaron M. Hunter, Santa Cruz, Calif. (US); Agus Tjandra, San Jose, Calif. (US); and Norman Tam, San Jose, Calif. (US) | ||
| Assigned to Applied Materials, Inc., Santa Clara, Calif. (US) | ||
| Filed on Aug. 02, 2005, as Appl. No. 11/195,395. | ||
| Claims priority of provisional application 60/613289, filed on Sep. 27, 2004. | ||
| Prior Publication US 2006/0066193 A1, Mar. 30, 2006 | ||
| Int. Cl. F26B 19/00 (2006.01); F27B 5/14 (2006.01) | ||
| U.S. Cl. 392—416 [219/390; 219/405; 219/411; 392/418; 118/724; 118/725; 118/50.1] | 9 Claims |
| 1. A lamp array for thermal processing comprising a plurality of lamps distributed in an array, said lamps having a predetermined
difference in radiance pattern between them, wherein said radiance pattern includes a variation in diffuseness or collimation;
wherein a first lamp located near a center of said array has a first radiance pattern and the others of said lamps in said
array have a second radiance pattern less diffuse than said first radiance pattern; and
wherein said first lamp additionally contains a diffusing disk.
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