| US 7,508,493 B2 | ||
| Exposure apparatus and device manufacturing method | ||
| Seiji Takeuchi, Utsunomiya (Japan); Kenji Yamazoe, Utsunomiya (Japan); Yumiko Ohsaki, Utsunomiya (Japan); and Minoru Yoshii, Utsunomiya (Japan) | ||
| Assigned to Canon Kabushiki Kaisha, Tokyo (Japan) | ||
| Filed on Feb. 15, 2007, as Appl. No. 11/675,204. | ||
| Claims priority of application No. 2006-037422 (JP), filed on Feb. 15, 2006. | ||
| Prior Publication US 2007/0188730 A1, Aug. 16, 2007 | ||
| Int. Cl. G03B 27/72 (2006.01) | ||
| U.S. Cl. 355—71 [355/69] | 10 Claims |
| 1. An exposure apparatus comprising:
an illumination optical system configured to illuminate a reticle;
a projection optical system configured to project a pattern of the reticle onto a substrate;
a polarization adjuster configured to independently adjust each polarization state of a plurality of areas in an effective
light source distribution used to illuminate the reticle;
a polarization measurement unit configured to measure a polarization state of light that has passed the polarization adjuster;
and
a controller configured to independently control each polarization state of the plurality of areas via the polarization adjuster
based on a measurement result of the polarization measurement unit,
wherein the polarization adjuster is divided into the plurality of areas, each area including a waveplate whose initial fast
axis angle is set so as to form the desired polarization state, and the controller is configured to independently correct
the fast axis angle of each waveplate based on the measurement result of the polarization measurement unit.
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