| US 7,507,458 B2 | ||
| Semi-reflective film and reflective film for optical information recording medium, optical information recording medium, and sputtering target | ||
| Katsutoshi Takagi, Kobe (Japan); Yuuki Tauchi, Kobe (Japan); and Junichi Nakai, Kobe (Japan) | ||
| Assigned to Kobe Steel, Ltd., Kobe-shi (Japan) | ||
| Filed on Jun. 29, 2005, as Appl. No. 11/168,497. | ||
| Claims priority of application No. 2004-190704 (JP), filed on Jun. 29, 2004. | ||
| Prior Publication US 2005/0287333 A1, Dec. 29, 2005 | ||
| Int. Cl. B32B 3/02 (2006.01) | ||
| U.S. Cl. 428—64.1 [428/64.4; 430/270.12] | 18 Claims |
| 1. A semi-reflective film or reflective film for an optical information recording medium, comprising a Ag based alloy, wherein
the Ag based alloy comprises
0.01 to 10 atomic percent of Li, and
0.005 to 0.8 atomic percent of Bi.
|