| US 7,501,625 B2 | ||
| Electron microscope application apparatus and sample inspection method | ||
| Hikaru Koyama, Kodaira (Japan); Hiroshi Makino, Kokubunji (Japan); and Mitsugu Sato, Hitachinaka (Japan) | ||
| Assigned to Hitachi High-Technologies Corporation, Tokyo (Japan) | ||
| Filed on May 30, 2006, as Appl. No. 11/442,566. | ||
| Claims priority of application No. 2005-158282 (JP), filed on May 31, 2005. | ||
| Prior Publication US 2006/0289755 A1, Dec. 28, 2006 | ||
| Int. Cl. G21K 7/00 (2006.01) | ||
| U.S. Cl. 250—311 [250/306; 250/400; 250/310; 250/398; 250/399; 324/765; 324/751; 324/752] | 14 Claims |
| 1. An electron microscope application apparatus, comprising:
means for irradiating ultraviolet light to an electrode provided above a sample and said sample and controlling incidence
of photoelectrons generated from said electrode and said sample by utilizing electric field applied between said electrode
and said sample,
wherein charges of said sample can be set to an arbitrary potential.
|