forming a gate line on a substrate;

forming a first insulating layer on the gate line;

forming a semiconductor layer on the flint insulating layer;

forming a conductive layer;

forming a data line and a drain electrode from the conductive layer and on the semiconductor Layer;

depositing passivation layer on the data line and the drain electrode;

forming a photoresist on the passivation layer;

etching the passivation layer and the first insulating layer using the photoresist as a mask to expose portions of the conductive layer and at least a part of the substrate;

partially removing an exposed portion of the conductive layer;

depositing a conductive film on the photoresist, and exposed portions of the conductive layer and the substrate; and

removing the photoresist and the conductive film deposited on the photoresist, to form a pixel electrode connected to the exposed portion of the drain electrode.