| US 7,501,220 B2 | ||
| Resist composition | ||
| Taku Hirayama, Kawasaki (Japan); Hideo Hada, Kawasaki (Japan); Satoshi Fujimura, Kawasaki (Japan); Takeshi Iwai, Kawasaki (Japan); Mitsuru Sato, Kawasaki (Japan); Ryoichi Takasu, Kawasaki (Japan); Toshikazu Tachikawa, Kawasaki (Japan); Jun Iwashita, Kawasaki (Japan); Keita Ishiduka, Kawasaki (Japan); Tomotaka Yamada, Kawasaki (Japan); Toshikazu Takayama, Kawasaki (Japan); and Masaaki Yoshida, Kawasaki (Japan) | ||
| Assigned to Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi (Japan) | ||
| Filed on May 13, 2004, as Appl. No. 10/845,620. | ||
| Application 10/845620 is a continuation in part of application No. PCT/JP2004/000704, filed on Jan. 27, 2004. | ||
| Claims priority of application No. 2003-025152 (JP), filed on Jan. 31, 2003; application No. 2003-045000 (JP), filed on Feb. 21, 2003; application No. 2003-062531 (JP), filed on Mar. 07, 2003; application No. 2003-125244 (JP), filed on Apr. 30, 2003; application No. 2003-157257 (JP), filed on Jun. 02, 2003; application No. 2003-195403 (JP), filed on Jul. 10, 2003; application No. 2003-426939 (JP), filed on Dec. 24, 2003; and application No. 2004-017355 (JP), filed on Jan. 26, 2004. | ||
| Prior Publication US 2005/0014090 A1, Jan. 20, 2005 | ||
| Int. Cl. G03F 7/00 (2006.01); G03F 7/004 (2006.01) | ||
| U.S. Cl. 430—270.1 [430/281.1; 430/286.1; 430/311] | 10 Claims |
| 1. A method of forming a resist pattern using a positive resist composition, comprising:
forming a resist layer which includes said resist composition and such that a region between said resist layer and a lens
at a lowermost point of an exposure apparatus being filled with a solvent which has a refractive index that is larger than
a refractive index of air but smaller than a refractive index of said resist layer, and
conducting immersion exposure after said forming, the positive resist composition consisting essentially of:
a resin component (A) which contains an acid dissociable, dissolution inhibiting group and displays increased alkali solubility
under action of acid, an acid generator component (B) that generates acid on exposure, and an organic solvent (C) capable
of dissolving said component (A) and said component (B), wherein said component (A) contains a structural unit (a1) derived from a (meth)acrylate ester containing an acid dissociable, dissolution inhibiting group and a structural unit (a2) derived from a (meth)acrylate ester containing a norbornane lactone unit, but contains no structural units (a0), including structural units (a0-1) containing an anhydride of a dicarboxylic acid and structural units (a0-2) containing a phenolic hydroxyl group.
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