US 7,501,153 B2
Alkoxide compound, thin film-forming material and method for forming thin film
Naoki Yamada, Tokyo (Japan); and Atsushi Sakurai, Tokyo (Japan)
Assigned to Adeka Corporation, Tokyo (Japan)
Appl. No. 11/665,833
PCT Filed Oct. 05, 2005, PCT No. PCT/JP2005/018445
§ 371(c)(1), (2), (4) Date Apr. 20, 2007,
PCT Pub. No. WO2006/043418, PCT Pub. Date Apr. 27, 2006.
Claims priority of application No. 2004-306777 (JP), filed on Oct. 21, 2004; and application No. 2004-343513 (JP), filed on Nov. 29, 2004.
Prior Publication US 2008/0085365 A1, Apr. 10, 2008
Int. Cl. C23C 16/00 (2006.01); C09D 1/00 (2006.01)
U.S. Cl. 427—248.1  [427/255.28; 106/287.18; 106/286.3] 13 Claims
OG exemplary drawing
 
1. An alkoxide compound represented by general formula (I) below:

OG Complex Work Unit Drawing
wherein R1 and R2 each independently represent a hydrogen atom or alkyl group having 1 to 4 carbon atoms, R3 and R4 each represent an alkyl group having 1 to 4 carbon atoms, and A represents an alkanediyl group having 1 to 8 carbon atoms.