| US 7,500,895 B2 | ||
| Patterned substrate, electro-optical device, and method for manufacturing an electro-optical device | ||
| Naoyuki Toyoda, Suwa (Japan); and Hirofumi Sakai, Suwa (Japan) | ||
| Assigned to Seiko Epson Corporation, Tokyo (Japan) | ||
| Filed on Dec. 12, 2005, as Appl. No. 11/298,751. | ||
| Claims priority of application No. 2004-362541 (JP), filed on Dec. 15, 2004. | ||
| Prior Publication US 2006/0127563 A1, Jun. 15, 2006 | ||
| Int. Cl. H01J 9/00 (2006.01) | ||
| U.S. Cl. 445—23 [445/25] | 5 Claims |
| 1. A patterned substrate, comprising
an element formation surface;
a laminated pattern having laminating patterns formed on the element formation surface by drying droplets containing a pattern
formation material,
wherein a lower layer pattern contains a surfactant that is lyophilic with respect to droplets that form an upper layer pattern.
|