| US 7,500,302 B2 | ||
| Process for fabricating a magnetic recording head with a laminated write gap | ||
| Wen-Chien Hsiao, San Jose, Calif. (US); Terence Lam, Cupertino, Calif. (US); Yinshi Liu, Foster City, Calif. (US); Michael Yang, San Jose, Calif. (US); and Samuel Yuan, Saratoga, Calif. (US) | ||
| Assigned to Hitachi Global Storage Technologies, Netherlands B.V., Amsterdam (Netherlands) | ||
| Filed on Apr. 11, 2005, as Appl. No. 11/104,212. | ||
| Prior Publication US 2006/0230602 A1, Oct. 19, 2006 | ||
| Int. Cl. G11B 5/127 (2006.01); H04R 31/00 (2006.01) | ||
| U.S. Cl. 29—603.14 [29/603.13; 29/603.15; 29/603.16; 29/603.18; 216/65; 360/122; 360/317; 427/127; 427/128; 451/5; 451/41] | 4 Claims |
| 1. A method for fabricating a magnetic recording head comprising:
fabricating a pedestal structure;
fabricating a laminated write gap structure comprising at least one magnetic layer upon said pedestal structure, wherein said
laminated write gap structure has a throat height, and wherein said throat height only overlies a portion of the pedestal
structure; and
fabricating an upper pole upon the laminated write gap structure,
wherein, said laminated write gap structure further comprises a first inert layer disposed between said at least one magnetic
layer and said upper pole; and
wherein said first inert layer comprises a laminate of rhodium (Rh) and tantalum (Ta).
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