| US 7,499,168 B2 | ||
| Combined modulated optical reflectance and electrical system for ultra-shallow junctions applications | ||
| Alex Salnik, Castro Valley, Calif. (US); Lena Nicolaides, Castro Valley, Calif. (US); and Jon Opsal, Livermore, Calif. (US) | ||
| Assigned to KLA-Tencor Corp., Milpitas, Calif. (US) | ||
| Filed on Jan. 23, 2007, as Appl. No. 11/656,610. | ||
| Claims priority of provisional application 60/772892, filed on Feb. 14, 2006. | ||
| Prior Publication US 2007/0188761 A1, Aug. 16, 2007 | ||
| Int. Cl. G01N 21/00 (2006.01) | ||
| U.S. Cl. 356—432 [356/445] | 10 Claims |
| 1. An apparatus for evaluating a semiconductor sample comprising:
a light source for generating an intensity modulated pump beam;
optics for directing the pump beam onto the sample in a manner to periodically excite a region of the sample and create an
electron hole plasma;
a light source for generating a probe beam which is directed to the sample within the periodically excited region;
a photodetector for monitoring modulated changes in the reflected probe beam induced by the periodic excitation and generating
first output signals in response thereto;
a pair of capacitive electrodes positioned close to and spaced from the sample surface and near the periodically excited region;
a circuit connected to said electrodes for measuring modulated changes in voltage induced by the periodic excitation and generating
second output signals in response thereto; and
a processor for analyzing the sample based on a combination of the first and second output signals.
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