| US 7,499,147 B2 | ||
| Generation method of light intensity distribution, generation apparatus of light intensity distribution, and light modulation element assembly | ||
| Yukio Taniguchi, Yokohama (Japan); Hiroyuki Ogawa, Nara (Japan); Masayuki Jyumonji, Yokohama (Japan); Noritaka Akita, Hiratsuka (Japan); and Masakiyo Matsumura, Kamakura (Japan) | ||
| Assigned to Advanced LCD Technologies Development Center Co., Ltd., Yokohama-shi (Japan) | ||
| Filed on Feb. 07, 2006, as Appl. No. 11/275,961. | ||
| Claims priority of application No. 2005-031188 (JP), filed on Feb. 08, 2005. | ||
| Prior Publication US 2006/0177973 A1, Aug. 10, 2006 | ||
| Int. Cl. G03B 27/72 (2006.01); G03B 27/32 (2006.01) | ||
| U.S. Cl. 355—69 [355/77] | 10 Claims |
| 1. A generation method of a light intensity distribution, comprising:
passing a light beam through a first light modulation element and a second light modulation element which are arranged to
be apart from each other by a distance D and face each other in parallel to optically modulate the light beam that enters
the light modulation elements, thereby generating a light intensity distribution on a focusing plane of an image forming optical
system located on an optical axis of the second light modulation element, the focusing plane being positioned on a surface
to be treated at a substrate,
wherein the first light modulation element has a pattern formed by repeating a basic unit having a pitch P, and
wherein the distance D satisfies the following condition:
D≈P2(2+n1)/2λ
where λ is a wavelength of the light beam, and n is an integer equal to or above 0 (0, 1, 2, 3. . . ).
|