| US 7,499,146 B2 | ||
| Lithographic apparatus and device manufacturing method, an integrated circuit, a flat panel display, and a method of compensating for cupping | ||
| Kars Zeger Troost, Waalre (Netherlands); Johannes Jacobus Matheus Baselmans, Oirschot (Netherlands); Arno Jan Bleeker, Westerhoven (Netherlands); Louis Markoya, Sandy Hook, Conn. (US); Neal Callan, Lake Oswego, Oreg. (US); and Nicholas K. Eib, San Jose, Calif. (US) | ||
| Assigned to ASML Netherlands B.V., Veldhoven (Netherlands); ASML Holding N.V., Veldhoven (Netherlands); and LSI Logic Corporation, Milpitas, Calif. (US) | ||
| Filed on Oct. 19, 2005, as Appl. No. 11/252,877. | ||
| Application 11/252877 is a continuation of application No. 11/078711, filed on Mar. 14, 2005, abandoned. | ||
| Prior Publication US 2006/0203220 A1, Sep. 14, 2006 | ||
| Int. Cl. G03B 27/54 (2006.01); G03B 27/42 (2006.01) | ||
| U.S. Cl. 355—67 [355/53] | 19 Claims |
| 14. A patterning array, comprising:
a first patterning array in a plurality of patterning arrays, the first patterning array comprising an array of individually
controllable elements configured to modulate a radiation beam; and
an adjusting device configured to individually adjust a linear position and tilt of each of the individually controllable
elements.
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