	US 7,498,120 B2
	Vacuum compatible high frequency electromagnetic and millimeter wave source components, devices and methods of micro-fabricating
Laurence P. Sadwick, Salt Lake City, Utah (US); Jehn-Huar Chern, Salt Lake City, Utah (US); and Ruey-Jen Hwu, Salt Lake City, Utah (US)
Assigned to Innosys, Inc., Salt Lake City, Utah (US)
Filed on Sep. 15, 2004, as Appl. No. 10/941,689.
Prior Publication US 2006/0057505 A1, Mar. 16, 2006
Int. Cl. G03F 7/00 (2006.01)

U.S. Cl. 430—315 [430/319; 430/321]

50 Claims

1. A method of micro-fabricating high frequency electromagnetic wave source components, comprising:

providing a substrate;

providing a UV-curable photoresist;

using said UV-curable photoresist and photolithography to define at least one from the group consisting of: an output cavity, a waveguide and an alignment feature, on said substrate, wherein using a UV-curable photoresist and photolithography to define at least one of an output cavity, a waveguide or an alignment feature comprises:

coating said substrate with a UV-curable photoresist;

heating said UV-curable photoresist coated substrate at a predetermined temperature and for a predetermined heating duration to drive off solvent in said UV-curable photoresist to obtain a solid UV-curable photoresist layer having a predetermined thickness;

masking said UV-curable photoresist coated substrate with a mask defining said at least one of an output cavity, a waveguide or an alignment feature;

exposing said masked UV-curable photoresist coated substrate to UV light comprising a predetermined intensity for a predetermined exposure time to obtain cured and uncured photoresist;

removing said uncured photoresist leaving said at least one of an output cavity, a waveguide or an alignment feature having substantially vertical sidewalls; and

plating said at least one of an output cavity, a waveguide or an alignment feature; and

using said UV-curable photoresist and photolithography to define at least one from the group consisting of: a coupling slot, a waveguide iris and a pumpout feature, on said substrate.