| US 7,497,908 B2 | ||
| Film coating unit and film coating method | ||
| Tsuyoshi Mizuno, Tokyo (Japan); Yuuichi Mikata, Yokohama (Japan); and Kimihide Saito, Gunma (Japan) | ||
| Assigned to Sanyo Electric Co., Ltd, (Japan); and Kabushiki Kaisha Toshiba, (Japan) | ||
| Filed on Jun. 23, 2004, as Appl. No. 10/875,075. | ||
| Claims priority of application No. 2003-178626 (JP), filed on Jun. 23, 2003. | ||
| Prior Publication US 2004/0265493 A1, Dec. 30, 2004 | ||
| Int. Cl. B05C 5/02 (2006.01) | ||
| U.S. Cl. 118—52 [118/319; 118/320; 118/321; 118/323] | 13 Claims |
| 1. A film coating unit for forming a coating film on a surface of a substrate, comprising:
a substrate holder for holding the substrate horizontally,
a coating solution discharge nozzle for applying coating solution to the surface of the substrate held by the substrate holder
in a direction from a front edge toward a rear edge of the substrate,
a driving section for relatively moving the substrate holder in a forward and backward direction with respect to the coating
solution discharge nozzle,
an anti-drying board opposed to the surface of the substrate in parallel relation thereto, the anti-drying board being disposed
so as to cover an entire range of the surface of the substrate to which the coating solution is applied by the coating solution
discharge nozzle,
a height adjustment mechanism for adjusting a relative height of the anti-drying board with respect to the substrate, and
a microprocessor including a memory for storing data which relates a kind of the coating solution to the relative height of
the anti-drying board with respect to the substrate, the microprocessor reading a relative height data corresponding to a
kind of a selected coating solution from the memory to output control signals to control the height adjustment mechanism.
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