| US 7,497,614 B2 | ||
| Apparatus for determining a temperature of a substrate and methods therefor | ||
| Keith Gaff, Fremont, Calif. (US); and Neil Martin Paul Benjamin, Austin, Tex. (US) | ||
| Assigned to Lam Research Corporation, Fremont, Calif. (US) | ||
| Filed on Jul. 27, 2007, as Appl. No. 11/829,833. | ||
| Application 11/829833 is a continuation of application No. 11/233561, filed on Sep. 22, 2005. | ||
| Prior Publication US 2008/0019418 A1, Jan. 24, 2008 | ||
| Int. Cl. G01K 11/00 (2006.01); G01K 13/00 (2006.01) | ||
| U.S. Cl. 374—161 [374/141; 374/120] | 25 Claims |
| 1. In a plasma processing system, an apparatus for measuring a temperature of a substrate, the apparatus comprising:
a phosphor material in direct contact with said substrate and in thermal contact with said substrate, said phosphor material
producing a fluorescent response in a first wavelength range when exposed to a electromagnetic radiation in a second wavelength
range, said fluorescent response decaying at a decay rate that is related to a temperature of said phosphor material;
a barrier window positioned between said phosphor material and a plasma, wherein said barrier window allows at least a portion
of said first wavelength and said second wavelength to be transmitted; and
a gasket configured to surround said phosphor material,
wherein said phosphor material, said barrier window, and said gasket are disposed inside a notch, said notch disposed on a
surface of said substrate.
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