| US 7,497,613 B2 | ||
| Probe with embedded heater for nanoscale analysis | ||
| William P. King, Atlanta, Ga. (US); and Mike Reading, Norwich (United Kingdom) | ||
| Assigned to Anasys Instruments, Santa Barbara, Calif. (US) | ||
| Filed on Apr. 18, 2006, as Appl. No. 11/405,772. | ||
| Claims priority of provisional application 60/672270, filed on Apr. 18, 2005. | ||
| Prior Publication US 2006/0254345 A1, Nov. 16, 2006 | ||
| Int. Cl. G01K 1/00 (2006.01); G01K 13/00 (2006.01); G01N 23/00 (2006.01); G11B 3/00 (2006.01) | ||
| U.S. Cl. 374—141 [374/117; 374/164; 369/154; 250/306] | 8 Claims |
| 1. A microfabricated thermal probe, comprising;
a substrate,
a cantilever comprising a fixed end at the substrate and a planar surface extending from the substrate to a free end opposite
the fixed end,
a sharp probe tip, located at least substantially at the free end of the cantilever, the probe tip having a base that is coplanar
with the planar surface of the cantilever the probe tip extending out and away from the plane of the planar surface of the
cantilever to a sharp end,
at least two separate electrically conductive traces formed by an implant process on the cantilever; and,
at least one heating element with an active area, formed by an implant process on the cantilever, electrically connected to
and bridging the traces, wherein;
there is no spatial overlap between the base of the probe tip and the active area of the heating element,
the active area of the heating element is located at the free end of the cantilever and adjacent to the tip and heats the
tip; and,
the resistance of the heating element is greater than twice the resistance of the traces.
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