| US 7,495,771 B2 | ||
| Exposure apparatus | ||
| Satoshi Akimoto, Utsunomiya (Japan) | ||
| Assigned to Canon Kabushiki Kaisha, Tokyo (Japan) | ||
| Filed on Jul. 09, 2007, as Appl. No. 11/775,094. | ||
| Claims priority of application No. 2006-190829 (JP), filed on Jul. 11, 2006. | ||
| Prior Publication US 2008/0013099 A1, Jan. 17, 2008 | ||
| Int. Cl. G01B 11/02 (2006.01) | ||
| U.S. Cl. 356—500 [356/498; 356/508] | 6 Claims |
| 1. An exposure apparatus comprising:
a plurality of stations;
a plurality of substrate stages, each including reflection mirrors;
a plurality of interferometers corresponding to the plurality of stations, respectively, for causing the reflection mirrors
included in the substrate stage located in the station to reflect a measurement light and measuring the position of the substrate
stage;
a storage unit configured to store pieces of correction information established for every combination of the plurality of
interferometers and the plurality of reflection mirrors, for correcting a measurement error caused by at least one of the
interferometers or the reflection mirrors; and
a correction unit configured to correct the respective results measured by the plurality of interferometers on the basis of
the correction information corresponding to the combination of the reflection mirror and the interferometer among the pieces
of correction information stored in the storage unit;
wherein the stages are controlled on the basis of a output of the correction unit.
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