US 7,495,241 B2
Ion beam irradiation apparatus and insulating spacer for the same
Katsumi Ito, Tokyo (Japan); Kazuya Maekawa, Tokyo (Japan); Etsuo Takeuchi, Tokyo (Japan); Nobuo Yajima, Tokyo (Japan); and Junichi Sato, Tokyo (Japan)
Assigned to TDK Corporation, Tokyo (Japan)
Filed on Feb. 03, 2005, as Appl. No. 11/48,802.
Claims priority of application No. 2004-051457 (JP), filed on Feb. 26, 2004; application No. 2004-051459 (JP), filed on Feb. 26, 2004; application No. 2004-051462 (JP), filed on Feb. 26, 2004; and application No. 2004-094332 (JP), filed on Mar. 29, 2004.
Prior Publication US 2005/0211926 A1, Sep. 29, 2005
Int. Cl. H01J 27/02 (2006.01)
U.S. Cl. 250—492.21  [250/492.1; 250/492.3; 250/423 R; 315/111.21; 315/111.81] 11 Claims
OG exemplary drawing
 
4. An insulating spacer to be used in an ion beam irradiation apparatus comprising:
a plasma generation chamber in an interior of which a plasma is generated;
a process chamber connected with said plasma generation chamber; and
a plurality of grids disposed between said plasma generation chamber and said process chamber for extracting ions in said plasma, each of said grids having a plurality of holes, and said insulating spacer being disposed between said plurality of grids to prevent said grids from being in electrical contact with each other,
wherein a groove portion is formed along a circumference, which is different from surfaces abutting said grid, of said insulating spacer, said groove portion is recessed from said circumference of said insulating spacer in a direction different from a direction in which said ion beam is extracted, and a ratio of an opening of said groove portion to a depth of said groove portion is equal to or larger than 1,
said groove portion is recessed from said circumference of said insulating spacer in a direction perpendicular to the direction in which said ion beam is extracted, and
an edge portion of said groove portion that defines said opening of said groove portion is chamfered.