| US 7,333,180 B2 | ||
| Positioning apparatus and exposure apparatus using the same | ||
| Hideo Tanaka, Utsunomiya (Japan) | ||
| Assigned to Canon Kabushiki Kaisha, Tokyo (Japan) | ||
| Filed on Feb. 14, 2005, as Appl. No. 11/56,287. | ||
| Claims priority of application No. 2004-056225 (JP), filed on Mar. 01, 2004. | ||
| Prior Publication US 2005/0200827 A1, Sep. 15, 2005 | ||
| Int. Cl. G03B 27/58 (2006.01); G03B 27/42 (2006.01); H02K 41/00 (2006.01) | ||
| U.S. Cl. 355—72 [355/53; 310/12] | 13 Claims |
| 1. A positioning apparatus, comprising:
a first stage;
a first moving mechanism to move said first stage in a predetermined direction;
a second stage movable relative to said first stage;
a second moving mechanism to move said second stage with a smaller stroke than that of said first stage;
at least two magnetic plates disposed on opposite sides of said second stage in the predetermined direction; and
at least two pairs of electromagnets each having a coil and a core member disposed on said first stage,
wherein each pair of electromagnets is arranged to sandwich one of said at least two magnetic plates in the predetermined
direction in a non-contact manner.
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