| US 7,493,588 B2 | ||
| Mixing and matching method and integration system for providing backup strategries for optical environments and method for operating the same | ||
| Chin-Cheng Yang, Hsinchu (Taiwan) | ||
| Assigned to MACRONIX International Co., Ltd., Hsinchu (Taiwan) | ||
| Filed on Aug. 01, 2005, as Appl. No. 11/195,069. | ||
| Prior Publication US 2007/0026322 A1, Feb. 01, 2007 | ||
| Int. Cl. G06F 17/50 (2006.01) | ||
| U.S. Cl. 716—19 [716/21] | 23 Claims |
| 19. An integration system for providing a set of backup strategies for a primary optical environment having a first numerical
aperture (NA) and a first off-axis illumination (OAI) mode for a fist design rule, wherein under the primary optical environment
with a mask having a first critical dimension behavior on the mask corresponding to the first design rule, a second critical
dimension behavior on a developed photoresist is generated, and each backup strategy of the set of the backup strategies includes
a plurality of backup optical environments and each backup optical environment possesses a second OAI mode, the integration
system comprising:
means for receiving information with respect to the primary optical environment and the first design rule;
means for storing a calibration database, wherein a plurality of mask modification factors and OAI adjustment parameters of
the plurality of backup optical environments with respect to a plurality of design rules are recorded in the calibration database;
means for retrieving modification rules from the calibration database according to the information;
means for determining whether the first design rule possess high demand on a product critical dimension or a low demand on
the product critical dimension;
means for outputting the set of backup strategies, wherein
when the first design rule has the high demand on the product critical dimension, the set of backup strategies includes a
plurality of modification rules for the plurality of backup optical environments respectively, and for each backup optical
environment, by applying a corresponding modification rule to modify the each backup optical environment, a third critical
dimension behavior on another developed photoresist obtained by using the modified backup optical environment is as same as
the second critical dimension behavior; and
when the first design rule has the low demand on the product critical dimension, the plurality of backup strategies includes
a plurality of OAI adjustment parameters for the plurality of backup optical environments respectively, and for each backup
optical environment, by adjusting the second OAI mode of the each backup optical environment to be a third OAI mode based
on a corresponding OAI adjustment parameter, a fourth critical dimension behavior on another developed photoresist obtained
by using the each backup optical environment with the mask and the third OAI mode approximates to the second critical dimension
behavior.
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