| US 7,491,954 B2 | ||
| Drive laser delivery systems for EUV light source | ||
| Alexander N. Bykanov, San Diego, Calif. (US); Igor V. Fomenkov, San Diego, Calif. (US); Oleh Khodykin, San Diego, Calif. (US); and Alexander I. Ershov, San Diego, Calif. (US) | ||
| Assigned to Cymer, Inc., San Diego, Calif. (US) | ||
| Filed on Oct. 13, 2006, as Appl. No. 11/580,414. | ||
| Prior Publication US 2008/0087847 A1, Apr. 17, 2008 | ||
| Int. Cl. H01J 35/20 (2006.01) | ||
| U.S. Cl. 250—504R [250/493.1; 378/119] | 60 Claims |
| 1. An EUV light source comprising;
a target material;
a laser device;
a plasma chamber;
an optic positioned in the plasma chamber for reflecting EUV light generated therein;
a gaseous etchant disposed in the plasma chamber at a gaseous etchant pressure, p1; and
a beam delivery chamber having an input window for passing a laser beam from the laser device into the beam deliver chamber,
the delivery chamber formed with an opening to output the laser beam for interaction with the target material to create an
EUV light emitting plasma, wherein the delivery chamber has a gaseous etchant pressure, p2, with p1>p2.
|