| US 7,491,953 B2 | ||
| Ion implantation device and a method of semiconductor manufacturing by the implantation of boron hydride cluster ions | ||
| Thomas N. Horsky, Boxborough, Mass. (US); and Dale C. Jacobson, Salem, N.H. (US) | ||
| Assigned to Semequip, Inc., Billerica, Mass. (US) | ||
| Filed on Dec. 29, 2006, as Appl. No. 11/647,867. | ||
| Application 11/647867 is a division of application No. 10/519699, previously published as PCT/US03/20197, filed on Jun. 26, 2003. | ||
| Application 10/519699 is a continuation in part of application No. 10/183768, filed on Jun. 26, 2002, granted, now 6,686,595. | ||
| Claims priority of provisional application 60/463965, filed on Apr. 18, 2003. | ||
| Prior Publication US 2007/0194252 A1, Aug. 23, 2007 | ||
| Int. Cl. A61N 5/00 (2006.01) | ||
| U.S. Cl. 250—492.21 [250/396 ML; 250/298; 250/492.2] | 8 Claims |
| 4. A magnetic yoke assembly for generating a magnetic field, the magnetic yoke assembly comprising:
a yoke formed from a pair of pole pieces;
a pair of permanent magnets each having opposing North and South magnetic poles disposed between said pole pieces forming
a yoke assembly; and
a pair of aligned apertures formed in said pole pieces, wherein said pole pieces are formed with the same shape, wherein said
pair of pole pieces defines an upper pole piece and a lower pole piece and wherein said upper pole piece is configured to
connect like poles in said pair of magnets and said lower pole piece is configured to connect the opposing poles in said pair
of magnets.
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