| US 7,491,946 B2 | ||
| Electrostatic deflection system for corpuscular radiation | ||
| Stefan Risse, Jena (Germany); Thomas Peschel, Jena (Germany); Christoph Damm, Jena (Germany); Andreas Gebhardt, Apolda (Germany); Mathias Rohde, Jena (Germany); Christoph Schenk, Jena (Germany); Thomas Elster, Jena (Germany); Hans-Joachim Doering, Jena (Germany); and Gerhard Schubert, Jena (Germany) | ||
| Assigned to Leica Microsystems Lithography GmbH, Jena (Germany) | ||
| Filed on Feb. 03, 2006, as Appl. No. 11/346,666. | ||
| Claims priority of application No. 10 2005 005 801 (DE), filed on Feb. 04, 2005. | ||
| Prior Publication US 2006/0192133 A1, Aug. 31, 2006 | ||
| Int. Cl. H01J 37/147 (2006.01) | ||
| U.S. Cl. 250—396R | 21 Claims |

| 1. An electrostatic deflection system for corpuscular beams, comprising:
an axially symmetric arrangement through which an electron beam is directed, said arrangement being formed as an inwardly
hollow carrier in which rod-shaped electrodes are held;
said carrier having two ends in direction of a longitudinal symmetry axis of the deflection system and being formed of at
least two carrier members which are connected to one another.
|