| US 7,491,933 B2 | ||
| Electron beam apparatus | ||
| Mitsugu Sato, Hitachinaka (Japan); and Hideo Todokoro, Hinode-machi (Japan) | ||
| Assigned to Hitachi, Ltd., Tokyo (Japan) | ||
| Filed on Sep. 26, 2005, as Appl. No. 11/234,300. | ||
| Application 11/234300 is a continuation of application No. 10/111459, filed on Apr. 25, 2002, abandoned. | ||
| Prior Publication US 2006/0016992 A1, Jan. 26, 2006 | ||
| Int. Cl. G01N 23/00 (2006.01); G21K 7/00 (2006.01); H01J 3/14 (2006.01) | ||
| U.S. Cl. 250—310 [250/306; 250/307; 250/396 R; 250/397; 250/398; 250/399; 250/400] | 19 Claims |
| 1. An electron beam apparatus comprising:
an electron source for emitting an electron beam;
a focusing lens for focusing said electron beam;
an objective lens for generating a focusing field which focuses the electron beam on a sample; and
an image shift deflector for deflecting for deflecting the electron beam by moving a field of view from an optical axis of
the electron beam apparatus, making the electron beam pass through an intersection point of the optical axis with the focusing
field, the image shift deflector further comprising:
an energy dispersion unit for generating an energy dispersion field which disperses energy of the electron beam; and
an energy dispersion control unit for adjusting the energy dispersion field according to distance amount of the field of view
by the image shift deflector.
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