US 7,491,291 B2
Apparatus for trapping residual products in semiconductor device fabrication equipment
Jin-Jun Park, Seoul (Korea, Republic of)
Assigned to Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do (Korea, Republic of)
Filed on Jan. 03, 2006, as Appl. No. 11/322,388.
Claims priority of application No. 10-2005-0006169 (KR), filed on Jan. 24, 2005.
Prior Publication US 2006/0162862 A1, Jul. 27, 2006
Int. Cl. C23F 1/00 (2006.01); H01L 21/306 (2006.01)
U.S. Cl. 156—345.29 20 Claims
OG exemplary drawing
 
1. Apparatus for trapping residual products in gas in an exhaust system, comprising:
a housing in the form of a hollow cylinder, and having a gas inlet and a gas outlet at opposite ends thereof; and
first and second cooling plates alternately disposed within the housing in the direction of the longitudinal axis of the housing, each of the first cooling plates having a first base and a plurality of concentric first grid members, the first base extending across the housing and defining a circular vent hole which extends through a central portion of the first base and is open to with the interior of the housing, and the plurality of concentric first grid members projecting from a surface of the first base at locations radially outwardly of the vent hole, and each of the second cooling plates having a second base and a plurality of concentric second grid members, the second base extending across the housing and defining a plurality of vent holes which extend through an outer peripheral portion of the second base and are open to the interior of the housing, and the plurality of concentric second grid members projecting from a surface of the second base at locations radially inwardly of the plurality of vent holes.