| US 7,491,117 B2 | ||
| Substrate holding apparatus | ||
| Tetsuji Togawa, Chigasaki (Japan); Ikutaro Noji, Yokohama (Japan); Keisuke Namiki, Fujisawa (Japan); Hozumi Yasuda, Fujisawa (Japan); Shunichiro Kojima, Yokohama (Japan); Kunihiko Sakurai, Yokohama (Japan); Nobuyuki Takada, Fujisawa (Japan); Osamu Nabeya, Chigasaki (Japan); Makoto Fukushima, Yokohama (Japan); and Hideki Takayanagi, Tokyo (Japan) | ||
| Assigned to Ebara Corporation, Tokyo (Japan) | ||
| Filed on Jun. 14, 2006, as Appl. No. 11/452,218. | ||
| Application 11/452218 is a division of application No. 11/028629, filed on Jan. 05, 2002, granted, now 7,083,507. | ||
| Application 11/028629 is a division of application No. 09/973842, filed on Oct. 11, 2001, granted, now 6,852,019. | ||
| Claims priority of application No. 2000-311071 (JP), filed on Oct. 11, 2000; and application No. 2001-013899 (JP), filed on Jan. 22, 2001. | ||
| Prior Publication US 2006/0234609 A1, Oct. 19, 2006 | ||
| Int. Cl. B24B 7/22 (2006.01) | ||
| U.S. Cl. 451—288 [451/398; 451/388] | 5 Claims |
| 1. A substrate holding apparatus for holding a substrate and applying a pressing force to press the substrate against a polishing
surface, said substrate holding apparatus comprising:
a top ring body for holding the substrate, said top ring body being made of a non-magnetic material;
an elastic pad to be brought into contact with the substrate, said elastic pad being made of a rubber material; and
a contact member including
(i) an elastic member to be brought into contact with said elastic pad, said elastic member including a protrusion that extends
radially from a circumferential edge at a lower surface of said elastic member, and
(ii) a holding member for detachably holding said elastic member, said holding member being made of a non-magnetic material,
wherein said elastic member and said holding member define a central pressure chamber.
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