| US 7,489,387 B2 | ||
| Exposure apparatus and device fabrication method | ||
| Hiromi Suda, Utsunomiya (Japan) | ||
| Assigned to Canon Kabushiki Kaisha, Tokyo (Japan) | ||
| Filed on Nov. 26, 2007, as Appl. No. 11/944,777. | ||
| Claims priority of application No. 2006-324693 (JP), filed on Nov. 30, 2006; and application No. 2007-287855 (JP), filed on Nov. 05, 2007. | ||
| Prior Publication US 2008/0129975 A1, Jun. 05, 2008 | ||
| Int. Cl. G03B 27/72 (2006.01); G03B 27/42 (2006.01); G03B 27/54 (2006.01) | ||
| U.S. Cl. 355—71 [355/53; 355/67] | 9 Claims |
| 1. An exposure apparatus comprising:
an illumination optical system configured to illuminate a reticle with a light beam from a light source; and
a projection optical system configured to project a pattern image of the reticle onto a substrate;
said illumination optical system including a light-shielding member which is arranged near a plane conjugate to a pupil plane
of said projection optical system and which can move along an optical axis of said illumination optical system,
wherein said light-shielding member is moved such that a light intensity distribution on the pupil plane of said projection
optical system becomes nonuniform.
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