US 7,488,922 B2
	Susceptor system
Giacomo Nicolao Maccalli, Novate Milanese (Italy); Olle Kordina, Oldsmar, Fla. (US); Gianluca Valente, Milan (Italy); Danilo Crippa, Novara (Italy); and Franco Preti, Milan (Italy)
Assigned to E.T.C. Epitaxial Technology Center SRL, Catania (Italy)
Appl. No. 10/538,416 PCT Filed Dec. 10, 2002, PCT No. PCT/IT02/00773 § 371(c)(1), (2), (4) Date Jun. 10, 2005, PCT Pub. No. WO2004/053187, PCT Pub. Date Jun. 24, 2004.
Prior Publication US 2006/0081187 A1, Apr. 20, 2006
Int. Cl. H05B 6/10 (2006.01); C23C 16/00 (2006.01)

U.S. Cl. 219—634  [118/724]

25 Claims

1. A susceptor system for an apparatus for the treatment of substrates and/or wafers, provided with a treatment chamber (1) delimited by at least two walls and with at least one heating solenoid (9), comprising at least one susceptor element (2, 3) delimited by an outer surface and made of electrically conducting material suitable for being heated by electromagnetic induction, characterized in that the at least one susceptor element (2, 3) is hollow so as to have at least one through hole which extends in a longitudinal direction, and in that a first portion of the outer surface of the at least one susceptor element (2, 3) is suitable for acting as a wall of the treatment chamber (1), and in that a second portion of the outer surface of the at least one susceptor element (2, 3) is suitable for being disposed close to the heating solenoid (9).