| US 7,488,568 B2 | ||
| Resist composition, method of forming resist pattern, compound and acid generator | ||
| Takeshi Iwai, Kawasaki (Japan); Hideo Hada, Kawasaki (Japan); Masaru Takeshita, Kawasaki (Japan); Akiya Kawaue, Kawasaki (Japan); Keita Ishiduka, Kawasaki (Japan); Hiroaki Shimizu, Kawasaki (Japan); Kyoko Ohshita, Kawasaki (Japan); Tsuyoshi Nakamura, Kawasaki (Japan); Komei Hirahara, Kawasaki (Japan); Yuichi Suzuki, Kawasaki (Japan); Takehiro Seshimo, Kawasaki (Japan); and Kensuke Matsuzawa, Kawasaki (Japan) | ||
| Assigned to Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi (Japan) | ||
| Filed on Apr. 01, 2008, as Appl. No. 12/60,695. | ||
| Prior Publication US 2008/0248422 A1, Oct. 09, 2008 | ||
| Int. Cl. G03F 7/004 (2006.01); G03F 7/30 (2006.01); C07D 333/46 (2006.01) | ||
| U.S. Cl. 430—270.1 [430/326; 430/905; 430/910; 430/922] | 15 Claims |
| 1. A resist composition comprising a base component (A) which exhibits changed solubility in an alkali developing solution
under action of acid and an acid-generator component (B) which generates acid upon irradiation,
said acid-generator component (B) comprising an acid generator (B1) comprised of a compound represented by general formula
(b1-8) shown below or an acid generator (B1′) comprised of a compound represented by general formula (b1-9) shown below:
 wherein R401 represents an acid dissociable, dissolution inhibiting group; R41 to R43 each independently represents a halogen atom, a halogenated alkyl group, an alkyl group, an acetyl group, an alkoxy group,
a carboxy group or a hydroxyalkyl group; Q represents a divalent linking group or a single bond; n0 represents an integer of 1 to 3, and n1 to n3 each independently represents an integer of 0 to 3, with the proviso that n0+n1 is 5 or less; and X− represents an anion;
 wherein R41 to R43 each independently represents a halogen atom, a halogenated alkyl group, an alkyl group, an acetyl group, an alkoxy group,
a carboxy group or a hydroxyalkyl group; R402 and R403 each independently represents a hydrogen atom, an alkyl group or a halogenated alkyl group; R404 represents an alkyl group or a halogenated alkyl group, wherein R403 and R404 may be bonded to each other to form a ring structure; n0 represents an integer of 1 to 3, and n1 to n3 each independently represents an integer of 0 to 3, with the proviso that n0+n1 is 5 or less; and X− represents an anion.
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