| US 7,487,649 B2 | ||
| Method for manufacturing glass substrate for image display | ||
| Daisuke Adachi, Kyoto (Japan); Hiroyasu Tsuji, Osaka (Japan); and Keisuke Sumida, Osaka (Japan) | ||
| Assigned to Panasonic Corporation, Osaka (Japan) | ||
| Appl. No. 10/499,327 PCT Filed Nov. 27, 2003, PCT No. PCT/JP03/15122 § 371(c)(1), (2), (4) Date Jun. 17, 2004, PCT Pub. No. WO2004/050569, PCT Pub. Date Jun. 17, 2004. |
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| Claims priority of application No. 2002-347187 (JP), filed on Nov. 29, 2002. | ||
| Prior Publication US 2005/0160768 A1, Jul. 28, 2005 | ||
| Int. Cl. C03B 18/20 (2006.01); C03B 18/14 (2006.01) | ||
| U.S. Cl. 65—99.4 [65/99.2; 65/32.5; 65/32.1; 65/29.18; 65/29.12] | 2 Claims |
| 1. A manufacturing method of a glass substrate for an image display device, comprising:
forming the glass substrate by a float method in a float furnace, an atmosphere in the float furnace including hydrogen and
nitrogen;
measuring a reflectance of the glass substrate at a wavelength of 220 nm by a reflectance measuring device; and
if the measured reflectance exceeds 5%, controlling a hydrogen concentration in the float furnace to be 2 vol. % or less,
so as to weaken a reducing force in the float furnace and thereby control an Sn++ content in the glass substrate.
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