| US 7,485,906 B2 | ||
| Colors only process to reduce package yield loss | ||
| Yang-Tung Fan, Jubei (Taiwan); Chiou-Shian Peng, Hsinchu (Taiwan); Cheng-Yu Chu, Hsinchu (Taiwan); Shih-Jane Lin, Hsin-Chu (Taiwan); Yen-Ming Chen, Hsinchu (Taiwan); Fu-Jier Fan, Jubei (Taiwan); and Kuo-Wei Lin, Hsinchu (Taiwan) | ||
| Assigned to Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu (Taiwan) | ||
| Filed on Dec. 20, 2006, as Appl. No. 11/642,225. | ||
| Application 10/272136 is a division of application No. 09/867379, filed on May 30, 2001, granted, now 6,482,669. | ||
| Application 11/642225 is a continuation of application No. 11/037445, filed on Jan. 18, 2005, granted, now 7,183,598. | ||
| Application 11/037445 is a continuation of application No. 10/272136, filed on Oct. 16, 2002, granted, now 6,876,049. | ||
| Prior Publication US 2007/0120155 A1, May 31, 2007 | ||
| Int. Cl. H01L 29/76 (2006.01); H01L 29/94 (2006.01); H01L 31/062 (2006.01); H01L 31/113 (2006.01); H01L 31/119 (2006.01) | ||
| U.S. Cl. 257—288 [257/98; 257/292; 257/E21.185; 257/E21.189; 257/E27.134; 257/E27.142] | 20 Claims |
| 1. A color imaging device, comprising:
a substrate;
a photosensor disposed above said substrate;
a passivation coating disposed above the photosensor;
a color filter layer disposed over the passivation coating; and
an upper layer formed over the color filter layer;
wherein the upper layer has an index of refraction that closely matches an index of refraction of the color filter layer.
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