US 7,485,289 B2
Cosmetic compositions containing a particular aminosilicone and a conditioner, and uses thereof
Jonathan Gawtrey, Boulogne (France); Serge Restle, Saint-Prix (France); Sandrine Decoster, Saint Gratien (France); and Pascale Lazzeri, Levallois Perret (France)
Assigned to L'Oreal, S.A., Paris (France)
Filed on Feb. 15, 2007, as Appl. No. 11/706,399.
Application 11/706399 is a division of application No. 10/290409, filed on Nov. 08, 2002, granted, now 7,223,385.
Claims priority of application No. 01 14476 (FR), filed on Nov. 08, 2001; and application No. 01 14477 (FR), filed on Nov. 08, 2001.
Prior Publication US 2007/0154441 A1, Jul. 05, 2007
This patent is subject to a terminal disclaimer.
Int. Cl. A61Q 5/12 (2006.01); A61Q 5/02 (2006.01)
U.S. Cl. 424—70.12  [424/70.1] 33 Claims
 
1. A cosmetic composition comprising, in a cosmetically acceptable medium, at least one conditioner chosen from synthetic oils, mineral oils, plant oils, fluoro oils and perfluoro oils, natural and synthetic waxes, compounds of ceramide type, carboxylic acid esters, silicones other than those of formulae (I) and (II), anionic polymers, nonionic polymers, cationic polymers, amphoteric polymers, cationic proteins, cationic protein hydrolysates and cationic surfactants and at least one aminosilicone chosen from aminosilicones of formulae (I) and (II) below:

OG Complex Work Unit Drawing
in which:
m and n are numbers such that the sum (n+m) ranges from 1 to 1000,
n is a number ranging from 0 to 999 and m is a number ranging from 1 to 1000;
R1, R2 and R3, which may be identical or different, are chosen from hydroxyl and C1-C4 alkoxy radicals, wherein at least one of the radicals R1, R2 and R3 is chosen from C1-C4 alkoxy radicals; and

OG Complex Work Unit Drawing
in which:
p and q are numbers such that the sum (p+q) ranges from 1 to 1000,
p is a number ranging from 0 to 999 and q is a number from 1 to 1000;
R1 and R2, which may be identical or different, are chosen from hydroxyl and C1-C4 alkoxy radicals, wherein the at least one of the radicals R1 and R2 is chosen from C1-C4 alkoxy radicals.