	US 7,483,155 B2
	Structure inspection method, pattern formation method, process condition determination method and resist pattern evaluation apparatus
Kei Hayasaki, Kamakura (Japan); Toru Mikami, Fujisawa (Japan); Shinichi Ito, Yokohama (Japan); Yuichiro Yamazaki, Tokyo (Japan); and Toshiya Kotani, Machida (Japan)
Assigned to Kabushiki Kaisha Toshiba, Tokyo (Japan)
Filed on Jan. 27, 2005, as Appl. No. 11/51,617.
Claims priority of application No. 2004-021647 (JP), filed on Jan. 29, 2004.
Prior Publication US 2005/0168758 A1, Aug. 04, 2005
Int. Cl. G01B 11/14 (2006.01); G06F 17/50 (2006.01); G03C 1/00 (2006.01)

U.S. Cl. 356—625 [716/19]

10 Claims

1. A structure inspection method comprising:

measuring wavelength dispersion of intensity of light reflected from an evaluation object located under an environment;

preparing a complex refractive index of a substance forming the evaluation object and a complex refractive index of a substance forming the environment;

setting virtual component ratios comprising a mixture ratio of the substance forming the evaluation object and the substance forming the environment in a predetermined space;

making a multiple interference calculation using the complex refractive index of the substance forming the evaluation object and the complex refractive index of the substance forming the environment, thereby calculating reflectance wavelength dispersions to the virtual component ratios;

extracting similar reflectance wavelength dispersions having a small difference with the measured wavelength dispersion from the reflectance wavelength dispersions;

making weighted average to the virtual component ratios used for calculating the similar reflectance wavelength dispersions so that weighting is larger when the difference is smaller, thereby calculating a component ratio of the substance forming the evaluation object and the substance forming the environment; and

determining a structure of the evaluation object from the calculated component ratio.