| US 7,480,980 B2 | ||
| Planar magnetic inductor and method for manufacturing the same | ||
| Hyung Mi Jung, Kyungki-do (Korea, Republic of); Jin Seok Moon, Kyungki-do (Korea, Republic of); Seok Bae, Seoul (Korea, Republic of); and Mano Yasuhiko, Kyungki-do (Korea, Republic of) | ||
| Assigned to Samsung Electro-Mechanics Co., Ltd., Kyungki-do (Korea, Republic of) | ||
| Filed on Mar. 15, 2007, as Appl. No. 11/724,211. | ||
| Application 11/724211 is a division of application No. 11/156485, filed on Jun. 21, 2005, abandoned. | ||
| Claims priority of application No. 2005-1833 (KR), filed on Jan. 07, 2005. | ||
| Prior Publication US 2007/0159287 A1, Jul. 12, 2007 | ||
| Int. Cl. H01F 7/06 (2006.01) | ||
| U.S. Cl. 29—602.1 [336/200] | 8 Claims |
| 1. A method for manufacturing a planar magnetic inductor is provided, comprising:
forming a lower insulating oxide magnetic layer on a substrate;
forming a conductive coil on the lower insulating oxide magnetic layer;
forming an upper insulating oxide magnetic layer directly on the conductive coil such that the conductive coil is completely
embedded in the upper insulating oxide magnetic layer; and
forming a cover layer on the upper insulating oxide magnetic layer,
wherein the lower and the upper insulating oxide magnetic layers are formed by ferrite plating.
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