| US 6,800,414 C1 (6635th) | ||
| RADIATION-SENSITIVE RESIN COMPOSITION | ||
| Yukio Nishimura, Mie, Japan; Noboru Yamahara, Mie, Japan; Masafumi Yamamoto, Mie, Japan; Toru Kajita, Mie, Japan; Tsutomu Shimokawa, Mie, Japan, and Hiroshi Ito, San Jose, Calif., assignors to JSR Corporation, Tokyo, Japan, and International Business Machines Corporation, Armonk, N.Y. | ||
| Reexamination Request No. 90/008,466, Feb. 1, 2007. | ||
| Reexamination Certificate for Patent 6,800,414, issued Oct. 5, 2004, Appl. No. 879,894, Jun. 14, 2001. | ||
| Claims priority, application Japan, Jun. 16, 2000, 2000-182297; Apr. 6, 2001, 2001-108824 | ||
| Int. Cl. G03F 7/004;7/039 (2006.01) | ||
| U.S. Cl. 430—270.1 |
| AS A RESULT OF REEXAMINATION, IT HAS BEEN DETERMINED THAT: |
| The patentability of claims 12 and 13 is confirmed. |
| Claims 14-16 and 18 are cancelled. |
| Claims 1-11, 17, 19 and 20 were not reexamined. |
12. A radiation-sensitive resin composition comprising (A) an acid-labile group-containing resin having a structure represented by the following formula (1); (B) a photoacid generator; and (C) a nitrogen containing organic compound as an acid diffusion controller:
wherein R1 represents a hydrogen atom, a monovalent acid-labile group, an alkyl group having 1-6 carbon atoms which does not have an acid-labile group, or an alkylcarbonyl group having 2-7 carbon atoms which does not have an acid-labile group, X1 represents a linear or branched fluorinated alkyl group having 1-4 carbon atoms, and R2 represents a hydrogen atom, a linear or branched alkyl group having 1-10 carbon atoms, or a linear or branched fluorinated alkyl group having 1-10 carbon atoms and wherein the nitrogen-containing organic compound selected from the group consisting of a compound shown by the following formula (10), a compound having two nitrogen atoms in the molecule, a polyamino compound or polymer having three or more nitrogen atoms, a quarternary ammonium hydroxide compound, an amide group-containing compound, a urea compound, and a nitrogen-containing heterocyclic compound:
wherein R12 individually represents a hydrogen atom, a substituted or unsubstituted, linear, branched, or cyclic alkyl group, substituted or unsubstituted aryl group, or substituted or unsubstituted aralkyl group.
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