| 1. An overlay mark formed on a photomask, the overlay mark comprising:
a first rectangular region, a second rectangular region adjacent to the first rectangular region, a third rectangular region
diagonal relative to the first rectangular region and adjacent to the second rectangular region, and a fourth rectangular
region diagonal relative to the second rectangular region and adjacent to both the first rectangular region and the third
rectangular region, wherein the first rectangular region is parallel to the third rectangular region, of and the second rectangular
region is perpendicular to the first rectangular region and parallel to the fourth rectangular region, the first rectangular
region and the third rectangular region respectively have a first pattern thereon, and the second rectangular region and the
fourth region respectively have thereon a second pattern which is distinct from the first pattern.
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