| US 7,479,644 B2 | ||
| Ion beam diagnostics | ||
| Geoffrey Ryding, Manchester, Mass. (US); Takao Sakase, Rowley, Mass. (US); Marvin Farley, Ipswich, Mass. (US); and Theodore Smick, Essex, Mass. (US) | ||
| Assigned to Applied Materials, Inc., Santa Clara, Calif. (US) | ||
| Filed on Oct. 30, 2006, as Appl. No. 11/589,156. | ||
| Prior Publication US 2008/0142727 A1, Jun. 19, 2008 | ||
| Int. Cl. H01J 37/317 (2006.01); H01L 21/265 (2006.01) | ||
| U.S. Cl. 250—491.1 [250/489; 250/492.21; 250/397; 250/398] | 32 Claims |
| 1. An ion implanter comprising:
an ion source operable to produce an ion beam;
ion optics operable to guide the ion beam along an ion beam path;
an array of sensors with an associated holder for holding the array of sensors in the ion beam path, each sensor being operable
to measure an ion beam current incident thereon; wherein the array of sensors comprises a two-dimensional array, and the sensors
are arranged linearly in rows and columns;
a moveable element positioned upstream of the array of sensors; and
an actuator arranged to move the moveable element across the ion beam path thereby to allow different portions of the ion
beam to be revealed to the array of sensors as the moveable element cuts through the ion beam.
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