	US 7,478,454 B2
	Manipulating device for photomasks that provides possibilities for cleaning and inspection of photomasks
Jakob Blattner, Ermatingen (Switzerland); and Rudy Federici, Berg (Switzerland)
Assigned to Brooks Automation, Inc., Chelmsford, Mass. (US)
Filed on Jul. 28, 2003, as Appl. No. 10/628,294.
Claims priority of application No. 1330/02 (CH), filed on Jul. 29, 2002.
Prior Publication US 2004/0111823 A1, Jun. 17, 2004
This patent is subject to a terminal disclaimer.
Int. Cl. B08B 6/00 (2006.01)

U.S. Cl. 15—303 [15/306.1; 15/309.2; 15/345; 15/405; 134/1.3; 134/133; 134/137; 134/200]

7 Claims

1. A detection/cleaning device for reticles employed in the production of electronic components, wherein the detection/cleaning device has a closable housing capable of holding a controlled atmosphere therein and having at least one closable loading opening for loading and unloading reticles into the closable housing; a cleaning unit, inside the closable housing and in which a cleaning chamber is constructed, at least one gas feed for introducing a pressurized fluid cleaning medium opens into the cleaning chamber, and at least one suction channel, through which the gas can be discharged from the cleaning chamber, leads from the cleaning chamber, wherein the cleaning chamber has at least one first opening for introducing and removing a reticle,

is further provided with a detection unit for detecting contaminants on articles used in semiconductor production, wherein, to this end, the detection unit has a detection device located inside the closable housing, into which a reticle can be introduced from one feed side of the detection unit, wherein the first opening of the cleaning chamber and the feed side lie on opposite sides of the cleaning chamber from each other, and

is provided with a feeding device, constructed so as to provide solely for exchanging a reticle between the cleaning unit and the detection unit.